Invention Grant
- Patent Title: Silicon hardmask layer for directed self-assembly
- Patent Title (中): 用于定向自组装的硅硬掩模层
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Application No.: US13862720Application Date: 2013-04-15
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Publication No.: US09249013B2Publication Date: 2016-02-02
- Inventor: Yubao Wang , Mary Ann Hockey , Douglas J. Guerrero , Vandana Krishnamurthy , Robert C. Cox
- Applicant: Brewer Science Inc.
- Applicant Address: US MO Rolla
- Assignee: Brewer Science Inc.
- Current Assignee: Brewer Science Inc.
- Current Assignee Address: US MO Rolla
- Agency: Hovey Williams LLP
- Main IPC: G03F7/26
- IPC: G03F7/26 ; B81C1/00 ; B81B1/00 ; H01L21/02 ; H01L21/033 ; H01L21/311
Abstract:
Compositions for directed self-assembly patterning techniques are provided which avoid the need for separate anti-reflective coatings and brush neutral layers in the process. Methods for directed self-assembly are also provided in which a self-assembling material, such as a directed self-assembly block copolymer, can be applied directly to the silicon hardmask neutral layer and then self-assembled to form the desired pattern. Directed self-assembly patterned structures are also disclosed herein.
Public/Granted literature
- US20130273330A1 SILICON HARDMASK LAYER FOR DIRECTED SELF-ASSEMBLY Public/Granted day:2013-10-17
Information query
IPC分类:
