Invention Grant
- Patent Title: Positive photosensitive resin composition
- Patent Title (中): 正型感光性树脂组合物
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Application No.: US14236971Application Date: 2012-07-17
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Publication No.: US09256118B2Publication Date: 2016-02-09
- Inventor: Ji-Yun Kwon , Jong-Hwa Lee , Hyun-Yong Cho , Dae-Yun Kim , Sang-Kyeon Kim , Sang-Kyun Kim , Sang-Soo Kim , Eun-Kyung Yoon , Jun-Ho Lee , Jin-Young Lee , Hwan-Sung Cheon , Chung-Beom Hong , Eun-Ha Hwang
- Applicant: Ji-Yun Kwon , Jong-Hwa Lee , Hyun-Yong Cho , Dae-Yun Kim , Sang-Kyeon Kim , Sang-Kyun Kim , Sang-Soo Kim , Eun-Kyung Yoon , Jun-Ho Lee , Jin-Young Lee , Hwan-Sung Cheon , Chung-Beom Hong , Eun-Ha Hwang
- Applicant Address: KR Gumi-si
- Assignee: Cheil Industries Inc.
- Current Assignee: Cheil Industries Inc.
- Current Assignee Address: KR Gumi-si
- Agency: Additon, Higgins & Pendleton, P.A.
- Priority: KR10-2011-0147877 20111230
- International Application: PCT/KR2012/005691 WO 20120717
- International Announcement: WO2013/100298 WO 20130704
- Main IPC: G03F7/023
- IPC: G03F7/023 ; G03F7/38 ; G03F7/105 ; G03C1/61 ; G03F7/022 ; G03F7/075

Abstract:
Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
Public/Granted literature
- US20140170562A1 Positive Photosensitive Resin Composition Public/Granted day:2014-06-19
Information query
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