Invention Grant
- Patent Title: Scanning electron microscope
- Patent Title (中): 扫描电子显微镜
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Application No.: US14379733Application Date: 2013-02-15
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Publication No.: US09305745B2Publication Date: 2016-04-05
- Inventor: Wataru Mori , Hiroyuki Ito , Yuko Sasaki , Hiromi Inada
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-040863 20120228
- International Application: PCT/JP2013/053608 WO 20130215
- International Announcement: WO2013/129125 WO 20130906
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/28 ; H01J37/05 ; H01J37/244 ; H01J37/09

Abstract:
The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.
Public/Granted literature
- US20150034824A1 SCANNING ELECTRON MICROSCOPE Public/Granted day:2015-02-05
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