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    Measurement and inspection device
    1.
    发明授权
    Measurement and inspection device 有权

    公开(公告)号：US10692687B2

    公开(公告)日：2020-06-23

    申请号：US16251563

    申请日：2019-01-18

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Wen Li ,  Shinichi Murakami ,  Hiroyuki Takahashi ,  Yuko Sasaki ,  Minoru Yamazaki ,  Hajime Kawano

    IPC: H01J37/147 ,  H01J37/04 ,  G01N23/2251 ,  H01L21/66

    Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.

    Scanning electron microscope
    2.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US09159529B2

    公开(公告)日：2015-10-13

    申请号：US14379704

    申请日：2013-02-18

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Minoru Yamazaki ,  Hideyuki Kazumi ,  Yuko Sasaki ,  Makoto Suzuki

    IPC: G01N23/00 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/1501 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/2814

    Abstract: It is an object of the present invention to provide a scanning electron microscope for discriminating an angle of an electron ejected from a sample without providing an opening for restricting the angle at outside of an axis. In order to achieve the object described above, there is proposed a scanning electron microscope which includes a deflector to deflect an irradiating position of an electron beam, and a control unit to control the deflector, and further includes a detector to detecting an electron provided by irradiating a sample with the electron beam, an opening configuring member arranged between the detector and the deflector and having an opening for passing the electron beam, and a secondary signal deflector to deflect an electron ejected from the sample, in which the secondary signal deflector is controlled to deflect the electron ejected from the sample toward an opening of passing the electron beam in accordance with a deflection control of the deflector.

    Abstract translation: 本发明的目的是提供一种扫描电子显微镜，用于鉴别从样品喷出的电子的角度，而不设置用于限制轴外的角度的开口。 为了实现上述目的，提出了一种扫描电子显微镜，其包括用于偏转电子束的照射位置的偏转器和用于控制偏转器的控制单元，并且还包括检测器，用于检测由 用电子束照射样品，布置在检测器和偏转器之间并具有用于使电子束通过的开口的开口构成部件和辅助信号偏转器，用于偏转从样品喷出的电子，其中次级信号偏转器是 被控制以根据偏转器的偏转控制将从样品喷出的电子偏转到通过电子束的开口。

    Charged particle beam apparatus and method for adjusting imaging conditions for the same
    3.
    发明授权
    Charged particle beam apparatus and method for adjusting imaging conditions for the same 有权

    公开(公告)号：US10566172B2

    公开(公告)日：2020-02-18

    申请号：US16184107

    申请日：2018-11-08

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Tomohito Nakano ,  Toshiyuki Yokosuka ,  Yuko Sasaki ,  Minoru Yamazaki ,  Yuzuru Mochizuki

    IPC: H01J37/21 ,  H01J37/141 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20 ,  H01J37/28

    Abstract: A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.

    Charged particle beam device
    6.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US10991542B2

    公开(公告)日：2021-04-27

    申请号：US16477986

    申请日：2017-01-27

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Ryota Watanabe ,  Yuko Sasaki ,  Kazunari Asao ,  Makoto Suzuki ,  Wataru Mori ,  Minoru Yamazaki

    IPC: H01J37/22 ,  H01J37/244 ,  H01J37/10 ,  H01J37/28

    Abstract: The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.

    Charged particle beam apparatus
    7.
    发明授权
    Charged particle beam apparatus 有权

    公开(公告)号：US09941095B2

    公开(公告)日：2018-04-10

    申请号：US15183952

    申请日：2016-06-16

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Ryota Watanabe ,  Yuko Sasaki ,  Akira Ikegami

    IPC: H01J37/21 ,  H01J37/28

    CPC classification number: H01J37/21 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24578 ,  H01J2237/281

    Abstract: An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.

    SCANNING ELECTRON MICROSCOPE
    8.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号：US20150034824A1

    公开(公告)日：2015-02-05

    申请号：US14379733

    申请日：2013-02-15

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Wataru Mori ,  Hiroyuki Ito ,  Yuko Sasaki ,  Hiromi Inada

    IPC: H01J37/28

    CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J2237/2801 ,  H01J2237/2806

    Abstract: The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.

    Abstract translation: 本发明的目的是提供一种扫描电子显微镜，其实现分辨率和图案识别能力的增加。 为了实现该目的，本发明提出了一种具有单色仪的扫描电子显微镜，其使电子束单色，单色器包括使电子束偏转的磁场发生器，以及通过一部分能量选择孔 由磁场发生器偏转的电子束。 通过从样品发射的一些电子的孔和检测已经通过孔的电子的检测器设置在由样品发射的电子被磁场发生器产生的磁场偏转的轨迹上。

    Charged particle beam device
    9.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US11152186B2

    公开(公告)日：2021-10-19

    申请号：US16354670

    申请日：2019-03-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Wataru Yamane ,  Minoru Yamazaki ,  Yuko Sasaki ,  Wataru Mori ,  Takashi Doi

    IPC: H01J37/147 ,  H01J37/244 ,  H01J37/22 ,  H01J37/10 ,  H01J37/28

    Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

    Measuring device and measuring method
    10.
    发明授权
    Measuring device and measuring method 有权

    公开(公告)号：US10707047B2

    公开(公告)日：2020-07-07

    申请号：US16325662

    申请日：2016-08-31

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Noritsugu Takahashi ,  Makoto Sakakibara ,  Wataru Mori ,  Hajime Kawano ,  Yuko Sasaki

    IPC: H01J37/20 ,  H01J37/12 ,  H01J37/21 ,  H01J37/244 ,  H01J37/10 ,  H01J37/141

    Abstract: A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

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