中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

10 records (took 0.017 seconds)

    Charged particle beam apparatus
    2.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US09208995B2

    公开(公告)日：2015-12-08

    申请号：US14379291

    申请日：2013-02-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yusuke Ominami ,  Takashi Ohshima ,  Hiroyuki Ito ,  Mitsugu Sato ,  Sukehiro Ito

    IPC: G21K5/00 ,  H01J37/28 ,  H01J37/16 ,  H01J37/18 ,  H01J37/09

    CPC classification number: H01J37/28 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/0451 ,  H01J2237/06341 ,  H01J2237/10 ,  H01J2237/1405 ,  H01J2237/164 ,  H01J2237/2608 ,  H01J2237/2801

    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110). The first diaphragm (10) is attached to the pipe (23), and the pipe (23) and the third housing (22) can be attached to and detached from the lens barrel (3) in the direction of the optical axis (30). A space (105) surrounded by the first housing (4) and the second housing (100) is depressurized, and the sample (6) arranged inside the recessed section (100a) is irradiated with a charged particle beam.

    Abstract translation: 提供了一种带电粒子束装置（111），隔膜（101）可以从其中容易地附接和拆卸，并且其中样品（6）可以在真空和高压下布置。 带电粒子束装置包括：保持带电粒子源（110）和电子光学系统（1,2,7）的镜筒（3）; 连接到镜筒（3）的第一壳体（4）; 第二壳体（100），其凹入到所述第一壳体（4）的内部; 分离透镜筒（3）内的空间与第一壳体（4）内的空间的第一隔膜（10），带电粒子束通过该第一隔膜 第二隔膜（101），其分离所述第二壳体（100）中的所述凹部（100a）的内部和外部的空间，并且所述带电粒子束穿过所述第二隔膜; 以及连接到容纳所述带电粒子源（110）的第三壳体（22）的管道（23）。 第一隔膜（10）附接到管道（23），并且管道（23）和第三壳体（22）可以沿着光轴（30）的方向附接到镜筒（3）并从镜筒 ）。 由第一壳体（4）和第二壳体（100）围绕的空间（105）被减压，并且将配置在凹部（100a）内部的样品（6）照射带电粒子束。

    CHARGED PARTICLE BEAM APPARATUS
    3.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20150014530A1

    公开(公告)日：2015-01-15

    申请号：US14379291

    申请日：2013-02-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yusuke Ominami ,  Takashi Ohshima ,  Hiroyuki Ito ,  Mitsugu Sato ,  Sukehiro Ito

    IPC: H01J37/28 ,  H01J37/09 ,  H01J37/18

    CPC classification number: H01J37/28 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/0451 ,  H01J2237/06341 ,  H01J2237/10 ,  H01J2237/1405 ,  H01J2237/164 ,  H01J2237/2608 ,  H01J2237/2801

    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110). The first diaphragm (10) is attached to the pipe (23), and the pipe (23) and the third housing (22) can be attached to and detached from the lens barrel (3) in the direction of the optical axis (30). A space (105) surrounded by the first housing (4) and the second housing (100) is depressurized, and the sample (6) arranged inside the recessed section (100a) is irradiated with a charged particle beam.

    Abstract translation: 提供了一种带电粒子束装置（111），隔膜（101）可以从其中容易地附接和拆卸，并且其中样品（6）可以在真空和高压下布置。 带电粒子束装置包括：保持带电粒子源（110）和电子光学系统（1,2,7）的镜筒（3）; 连接到镜筒（3）的第一壳体（4）; 第二壳体（100），其凹入到所述第一壳体（4）的内部; 分离透镜筒（3）内的空间与第一壳体（4）内的空间的第一隔膜（10），带电粒子束通过该第一隔膜 第二隔膜（101），其分离所述第二壳体（100）中的所述凹部（100a）的内部和外部的空间，并且所述带电粒子束通过所述第二隔膜; 以及连接到容纳所述带电粒子源（110）的第三壳体（22）的管道（23）。 第一隔膜（10）附接到管道（23），并且管道（23）和第三壳体（22）可以沿着光轴（30）的方向附接到镜筒（3）并从镜筒 ）。 由第一壳体（4）和第二壳体（100）围绕的空间（105）被减压，并且将配置在凹部（100a）内部的样品（6）照射带电粒子束。

    SCANNING ELECTRON MICROSCOPE
    5.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号：US20150034824A1

    公开(公告)日：2015-02-05

    申请号：US14379733

    申请日：2013-02-15

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Wataru Mori ,  Hiroyuki Ito ,  Yuko Sasaki ,  Hiromi Inada

    IPC: H01J37/28

    CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J2237/2801 ,  H01J2237/2806

    Abstract: The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.

    Abstract translation: 本发明的目的是提供一种扫描电子显微镜，其实现分辨率和图案识别能力的增加。 为了实现该目的，本发明提出了一种具有单色仪的扫描电子显微镜，其使电子束单色，单色器包括使电子束偏转的磁场发生器，以及通过一部分能量选择孔 由磁场发生器偏转的电子束。 通过从样品发射的一些电子的孔和检测已经通过孔的电子的检测器设置在由样品发射的电子被磁场发生器产生的磁场偏转的轨迹上。

    Charged particle beam device
    6.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US10319558B2

    公开(公告)日：2019-06-11

    申请号：US15022662

    申请日：2014-05-02

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yuko Sasaki ,  Hiroyuki Ito

    IPC: H01J37/153 ,  H01J37/147 ,  H01J37/141 ,  H01J37/12

    Abstract: Provided is a multifunctional charged particle beam device capable of inclining a beam with little aberration. The aberration is corrected by forming a local divergent field with a multipole, parallel current lines, or the like, matching the beam axis with the local divergent field via a conventional rotationally symmetric lens, deflector or astigmatism corrector, and counteracting an aberration occurring from another rotationally symmetric convex lens field.

    Scanning electron microscope
    7.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US09305745B2

    公开(公告)日：2016-04-05

    申请号：US14379733

    申请日：2013-02-15

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Wataru Mori ,  Hiroyuki Ito ,  Yuko Sasaki ,  Hiromi Inada

    IPC: H01J37/00 ,  H01J37/28 ,  H01J37/05 ,  H01J37/244 ,  H01J37/09

    CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J2237/2801 ,  H01J2237/2806

    Abstract: The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.

    Abstract translation: 本发明的目的是提供一种扫描电子显微镜，其实现分辨率和图案识别能力的增加。 为了实现该目的，本发明提出了一种具有单色仪的扫描电子显微镜，其使电子束单色，单色器包括使电子束偏转的磁场发生器，以及通过一部分能量选择孔 由磁场发生器偏转的电子束。 通过从样品发射的一些电子的孔和检测已经通过孔的电子的检测器设置在由样品发射的电子被磁场发生器产生的磁场偏转的轨迹上。

    MULTIPOLE MEASUREMENT APPARATUS
    8.
    发明申请
    MULTIPOLE MEASUREMENT APPARATUS 有权
    多点测量装置

    公开(公告)号：US20140217304A1

    公开(公告)日：2014-08-07

    申请号：US14241035

    申请日：2012-05-23

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Tomonori Nakano ,  Kotoko Urano ,  Hiroyuki Ito

    IPC: G21K1/00

    CPC classification number: G21K1/00 ,  H01J37/153 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/2446 ,  H01J2237/2826

    Abstract: In order to provide a multipole measurement apparatus that can easily obtain table data for an aberration corrector that corrects the aberrations in a charged particle beam apparatus, the multipole measurement apparatus, which is provided with an optical system (10), a space into which an aberration corrector (6) is to be inserted, and a position detector (7), measures the relationship between the incident position and angle of a primary charged particle beam on the aberration corrector (6) at a plurality of points, the irradiation position upon the position detector (7), and a multipole, in a state of having a multipole field excited and in a state of not having a multipole field excited, so as to extract multipole components contained in the measurement executed in the state of having the multipole field excited.

    Abstract translation: 为了提供一种可以容易地获得用于校正带电粒子束装置中的像差的像差校正器的表格数据的多极测量装置，具有光学系统（10）的多极测量装置， 将像差校正器（6）插入，并且位置检测器（7）测量多个点处的像差校正器（6）上的初级带电粒子束的入射位置和角度之间的关系， 位置检测器（7）和多极，具有被激励的多极场的状态，并且处于不具有多极场激励的状态，以便提取包含在具有多极的状态下的测量中的多极分量 场激动

Patent Agency Ranking