Invention Grant
- Patent Title: Apparatus for evaluating quality of crystal, and method and apparatus for manufacturing semiconductor light-emitting device including the apparatus
- Patent Title (中): 用于评价晶体质量的装置，以及包括该装置的半导体发光装置的制造方法和装置
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Application No.: US14602447Application Date: 2015-01-22
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Publication No.: US09334582B2Publication Date: 2016-05-10
- Inventor: Jong-uk Seo , Byoung-kyun Kim , Suk-ho Yoon , Keon-hun Lee , Kee-won Lee , Do-young Rhee , Sang-don Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2014-0018034 20140217
- Main IPC: H01L21/66
- IPC: H01L21/66 ; C30B25/08 ; H01L33/06 ; G01N21/95 ; H01L21/02 ; H01L33/00
Abstract:
An apparatus for evaluating the quality of a crystal includes an optical device that measures a surface reflectance of a wafer in which a V-pit is formed; and a data processing unit that calculates a threading dislocation density by calculating a difference in surface reflectance of the wafer that is measured by the optical device.
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