Invention Grant
- Patent Title: IGBT and diode
-
Application No.: US14718695Application Date: 2015-05-21
-
Publication No.: US09349827B2Publication Date: 2016-05-24
- Inventor: Hitoshi Matsuura , Makoto Koshimizu , Yoshito Nakazawa
- Applicant: RENESAS ELECTRONICS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2011-127305 20110607
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/36 ; H01L29/739 ; H01L29/861 ; H01L29/08 ; H01L29/10 ; H01L21/265 ; H01L29/16

Abstract:
In an IGBT, defects generated by ion implantation for introduction of the P-type collector region or N-type buffer region into the N−-type drift region near the N-type buffer region remain to improve the switching speed, however the leak current increases by bringing a depletion layer into contact with the crystal defects at the off time. To avoid this, an IGBT is provided which includes an N-type buffer region having a higher concentration than that of an N−-type drift region and being in contact with a P-type on its backside, and a defect remaining region provided near the boundary between the N-type buffer region and the N−-type drift region. The N−-type drift region located on the front surface side with respect to the defect remaining region is provided with an N-type field stopping region having a higher concentration than that of the N−-type drift region.
Public/Granted literature
- US20150255572A1 IGBT AND DIODE Public/Granted day:2015-09-10
Information query
IPC分类: