Invention Grant
- Patent Title: Exhaust gas abatement apparatus
- Patent Title (中): 废气排放装置
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Application No.: US14226741Application Date: 2014-03-26
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Publication No.: US09364786B2Publication Date: 2016-06-14
- Inventor: Kohtaro Kawamura , Toyoji Shinohara , Tetsuro Sugiura , Hideo Arai , Takashi Kyotani , Toshiharu Nakazawa , Keiichi Ishikawa , Seiji Kashiwagi , Yasuhiko Suzuki
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Baker & Hostetler LLP
- Priority: JP2013-069730 20130328
- Main IPC: B01D53/34
- IPC: B01D53/34 ; C23C16/44 ; F23G7/06 ; F04B37/06 ; F04B37/14
Abstract:
A vacuum pump has a discharge port coupled to an abatement chamber for treating an exhaust gas discharged from a chamber of a manufacturing apparatus to make the exhaust gas harmless. The vacuum pump is coupled to a heat exchanger configured to heat an inert gas by using heat generated when the exhaust gas is treated to be made harmless in the abatement part. The inert gas heated by the heat exchanger is introduced into the vacuum pump.
Public/Granted literature
- US20140290919A1 VACUUM PUMP WITH ABATEMENT FUNCTION Public/Granted day:2014-10-02
Information query
IPC分类:
