发明授权
- 专利标题: Magnetic memory and method of manufacturing the same
- 专利标题(中): 磁存储器及其制造方法
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申请号: US14203249申请日: 2014-03-10
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公开(公告)号: US09385304B2公开(公告)日: 2016-07-05
- 发明人: Masahiko Nakayama , Tadashi Kai , Masaru Toko , Hiroaki Yoda , Hyung Suk Lee , Jae Geun Oh , Choon Kun Ryu , Min Suk Lee
- 申请人: Masahiko Nakayama , Tadashi Kai , Masaru Toko , Hiroaki Yoda , Hyung Suk Lee , Jae Geun Oh , Choon Kun Ryu , Min Suk Lee
- 申请人地址: JP Tokyo KR Icheon-si, Gyeonggi-do
- 专利权人: KABUSHIKI KAISHA TOSHIBA,SK HYNIX INC.
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA,SK HYNIX INC.
- 当前专利权人地址: JP Tokyo KR Icheon-si, Gyeonggi-do
- 代理机构: Holtz, Holtz & Volek PC
- 主分类号: H01L27/00
- IPC分类号: H01L27/00 ; H01L43/02 ; H01L43/12 ; H01L45/00 ; G11C11/56 ; G11C11/15 ; G11C11/16 ; H01L27/22 ; H01L27/24 ; H01L43/08 ; H01L43/10
摘要:
According to one embodiment, a magnetic memory is disclosed. The memory includes a conductive layer containing a first metal material, a stacked body above the conductive layer, and including a first magnetization film containing a second metal material, a second magnetization film, and a tunnel barrier layer between the first magnetization film and the second magnetization film, and an insulating layer on a side face of the stacked body, and containing an oxide of the first metal material. The first magnetization film and/or the second magnetization film includes a first region positioned in a central portion, and a second region positioned in an edge portion and containing As, P, Ge, Ga, Sb, In, N, Ar, He, F, Cl, Br, I, Si, B, C, O, Zr, Tb, S, Se, or Ti.
公开/授权文献
- US20150069558A1 MAGNETIC MEMORY AND METHOD OF MANUFACTURING THE SAME 公开/授权日:2015-03-12
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