Invention Grant
- Patent Title: Peeling apparatus and manufacturing apparatus of semiconductor device
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Application No.: US14801093Application Date: 2015-07-16
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Publication No.: US09397126B2Publication Date: 2016-07-19
- Inventor: Shingo Eguchi , Yohei Monma , Atsuhiro Tani , Misako Hirosue , Kenichi Hashimoto , Yasuharu Hosaka
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2006-266531 20060929
- Main IPC: H01L21/58
- IPC: H01L21/58 ; H01L27/12 ; B32B43/00 ; H01L21/67 ; H01L21/683 ; H01L27/15 ; H01L33/00 ; H01L31/18 ; H01L31/20

Abstract:
To eliminate electric discharge when an element formation layer including a semiconductor element is peeled from a substrate used for manufacturing the semiconductor element, a substrate over which an element formation layer and a peeling layer are formed and a film are made to go through a gap between pressurization rollers. The film is attached to the element formation layer between the pressurization rollers, bent along a curved surface of the pressurization roller on a side of the pressurization rollers, and collected. Peeling is generated between the element formation layer and the peeling layer and the element formation layer is transferred to the film. Liquid is sequentially supplied by a nozzle to a gap between the element formation layer and the peeling layer, which is generated by peeling, so that electric charge generated on surfaces of the element formation layer and the peeling layer is diffused by the liquid.
Public/Granted literature
- US20160013221A1 PEELING APPARATUS AND MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE Public/Granted day:2016-01-14
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