Invention Grant
- Patent Title: Coating apparatus
- Patent Title (中): 涂装设备
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Application No.: US14525502Application Date: 2014-10-28
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Publication No.: US09401291B2Publication Date: 2016-07-26
- Inventor: Yuji Mimura , Tetsuya Maki , Shigeto Tsuruta , Tatsumi Oonishi , Daisuke Ikemoto , Takahiro Masunaga
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2013-235006 20131113; JP2014-108415 20140526
- Main IPC: B05B12/02
- IPC: B05B12/02 ; B05B1/04 ; B05C5/02 ; B05C11/10 ; H01L21/67

Abstract:
A coating apparatus includes: a slit nozzle including a retention chamber that retains the coating material; a moving mechanism that moves the slit nozzle; a pressure regulation unit that regulates a pressure inside the retention chamber; and a control unit that controls the moving mechanism and the pressure regulation unit to relatively move the slit nozzle with respect to the substrate while changing the pressure inside the retention chamber toward an atmospheric pressure from a negative pressure, wherein the control unit is configured to control the pressure regulation unit so that a change in the pressure inside the retention chamber in a start zone including a coating start position and an end zone including a coating end position becomes slower than a change in the pressure inside the retention chamber in a middle zone except the start zone and the end zone.
Public/Granted literature
- US20150128858A1 COATING APPARATUS Public/Granted day:2015-05-14
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