公开(公告)号：US11545383B2

公开(公告)日：2023-01-03

申请号：US17164928

申请日：2021-02-02

申请人： Tokyo Electron Limited

发明人： Tetsuya Maki ,  Toshifumi Inamasu

IPC分类号： H01L21/68 ,  H01L23/00 ,  H01L21/683 ,  H01L21/677 ,  F16C29/02 ,  H01L21/687

摘要： A substrate positioning apparatus includes a holder and a rotating device. The holder is configured to hold a substrate. The rotating device is configured to rotate the holder. The rotating device includes a rotation shaft, a bearing member, a base member, a driving unit and a damping device. The rotation shaft is fixed to the holder. The bearing member is configured to support the rotation shaft in a non-contact state. The bearing member is fixed on the base member. The driving unit is configured to rotate the rotation shaft. The damping device includes a rail connected to the base member and a slider connected to the rotation shaft, and is configured to produce a damping force against a relative operation between the rotation shaft and the base member by a resistance generated between the rail and the slider.

公开(公告)号：US09401291B2

公开(公告)日：2016-07-26

申请号：US14525502

申请日：2014-10-28

申请人： Tokyo Electron Limited

发明人： Yuji Mimura ,  Tetsuya Maki ,  Shigeto Tsuruta ,  Tatsumi Oonishi ,  Daisuke Ikemoto ,  Takahiro Masunaga

IPC分类号： B05B12/02 ,  B05B1/04 ,  B05C5/02 ,  B05C11/10 ,  H01L21/67

CPC分类号： H01L21/6715 ,  B05C5/0254 ,  B05C11/1013 ,  B05C11/1047 ,  H01L21/67253

摘要： A coating apparatus includes: a slit nozzle including a retention chamber that retains the coating material; a moving mechanism that moves the slit nozzle; a pressure regulation unit that regulates a pressure inside the retention chamber; and a control unit that controls the moving mechanism and the pressure regulation unit to relatively move the slit nozzle with respect to the substrate while changing the pressure inside the retention chamber toward an atmospheric pressure from a negative pressure, wherein the control unit is configured to control the pressure regulation unit so that a change in the pressure inside the retention chamber in a start zone including a coating start position and an end zone including a coating end position becomes slower than a change in the pressure inside the retention chamber in a middle zone except the start zone and the end zone.

摘要翻译： 涂布装置包括：狭缝喷嘴，其包括保持涂料的保留室; 使狭缝喷嘴移动的移动机构; 压力调节单元，其调节保持室内的压力; 以及控制单元，其控制所述移动机构和所述压力调节单元，以使所述狭缝喷嘴相对于所述基板相对移动，同时将所述保持室内的压力从负压变为大气压，其中，所述控制单元被配置为控制 压力调节单元，使得在包括涂层开始位置和包括涂层终止位置的端部区域的起始区域内的保持室内的压力变化比在中间区域中的保持室内部的压力变化慢，除了 起始区和结束区。

公开(公告)号：US20210249293A1

公开(公告)日：2021-08-12

申请号：US17164928

申请日：2021-02-02

申请人： Tokyo Electron Limited

发明人： Tetsuya Maki ,  Toshifumi Inamasu

IPC分类号： H01L21/68 ,  H01L21/677 ,  H01L21/683 ,  H01L23/00

摘要： A substrate positioning apparatus includes a holder and a rotating device. The holder is configured to hold a substrate. The rotating device is configured to rotate the holder. The rotating device includes a rotation shaft, a bearing member, a base member, a driving unit and a damping device. The rotation shaft is fixed to the holder. The bearing member is configured to support the rotation shaft in a non-contact state. The bearing member is fixed on the base member. The driving unit is configured to rotate the rotation shaft. The damping device includes a rail connected to the base member and a slider connected to the rotation shaft, and is configured to produce a damping force against a relative operation between the rotation shaft and the base member by a resistance generated between the rail and the slider.

公开(公告)号：US20220375799A1

公开(公告)日：2022-11-24

申请号：US17664486

申请日：2022-05-23

申请人： Tokyo Electron Limited

发明人： Tetsuya Maki ,  Tatsumi Oonishi ,  Toshifumi Inamasu

IPC分类号： H01L21/66 ,  H01L23/00

摘要： A bonding apparatus includes a first holder, a second holder, a first interferometer, a housing, a gas supply and an airflow control cover. The first holder attracts and holds the first substrate. The second holder attracts and holds the second substrate. The first interferometer measures, by radiating light to the second holder or a first object which is moved along with the second holder in the first horizontal direction, a distance to the second holder or the first object in the first horizontal direction. The housing accommodates therein the first holder, the second holder and the first interferometer. The gas supply is provided at a lateral side of the housing, and supplies a gas into the housing. The airflow control cover is provided within the housing, and redirects a part of a flow of the gas supplied from the gas supply toward a first path of the light.