Invention Grant
- Patent Title: P-type metal oxide semiconductor material and transistor
- Patent Title (中): P型金属氧化物半导体材料和晶体管
-
Application No.: US14982899Application Date: 2015-12-29
-
Publication No.: US09401433B1Publication Date: 2016-07-26
- Inventor: Shan-Haw Chiou , Tzu-Chi Chou , Wen-Hsuan Chao , Hsin-Ming Cheng , Mu-Tung Chang , Tien-Heng Huang , Ren-Fong Cai
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW104140699A 20151204
- Main IPC: H01L29/00
- IPC: H01L29/00 ; H01L29/786 ; H01L29/24 ; H01L21/02

Abstract:
A p-type metal oxide semiconductor material is provided, which is composed of AlxGe(1-x)Oy, wherein 0
Information query
IPC分类: