发明授权
US09436082B2 Compositions comprising base-reactive component and processes for photolithography
有权
包含碱反应性组分的组合物和用于光刻的方法
- 专利标题： Compositions comprising base-reactive component and processes for photolithography
- 专利标题（中）： 包含碱反应性组分的组合物和用于光刻的方法
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申请号： US13341067申请日： 2011-12-30
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公开(公告)号： US09436082B2公开(公告)日： 2016-09-06
- 发明人: Deyan Wang , Shintaro Yamada , Cong Liu , Mingqi Li , Joon-Seok Oh , Chunyi Wu , Doris Kang , Cheng-Bai Xu
- 申请人： Deyan Wang , Shintaro Yamada , Cong Liu , Mingqi Li , Joon-Seok Oh , Chunyi Wu , Doris Kang , Cheng-Bai Xu
- 申请人地址： US MA Marlborough
- 专利权人： Rohm and Haas Electronics Materials LLC
- 当前专利权人： Rohm and Haas Electronics Materials LLC
- 当前专利权人地址： US MA Marlborough
- 代理机构： Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- 代理商 Peter F. Corless
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30 ; G03F7/039 ; G03F7/11
摘要：
New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist.