Invention Grant
- Patent Title: Photoresist composition and method of manufacturing a thin film transistor substrate
- Patent Title (中): 光刻胶组合物和制造薄膜晶体管衬底的方法
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Application No.: US14522771Application Date: 2014-10-24
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Publication No.: US09448476B2Publication Date: 2016-09-20
- Inventor: Sung-Kyun Park , Jeong-Min Park , Jung-Soo Lee , Ji-Hyun Kim , Jun Chun , Ki-Hyun Cho , Hyoc-Min Youn , Tai-Hoon Yeo , Jin-Sun Kim , Byung-Uk Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2014-0008826 20140124
- Main IPC: G03F7/30
- IPC: G03F7/30 ; G03F7/033 ; G03F7/028 ; H01L21/02 ; H01L21/312 ; G03F7/038 ; H01L21/311
Abstract:
A photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer including at least five functional groups, about 1 to 50 parts by weight of a second acrylate monomer including at most four functional groups with respect to about 100 parts by weight of an acryl-copolymer.
Public/Granted literature
- US20150212411A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE Public/Granted day:2015-07-30
Information query
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