- Patent Title: Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
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Application No.: US14833245Application Date: 2015-08-24
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Publication No.: US09469705B2Publication Date: 2016-10-18
- Inventor: Vipul Jain , Paul J. LaBeaume , James W. Thackeray , James F. Cameron , Suzanne M. Coley , Amy M. Kwok , David A. Valeri
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F22/10 ; C07C309/12 ; C07C381/12 ; C08F220/18 ; C08F220/24 ; C08F220/28 ; C08F220/38 ; G03F7/039 ; G03F7/20 ; G03F7/38 ; H01L21/027
Abstract:
A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
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