Invention Grant
- Patent Title: Controlled metal extrusion opening in semiconductor structure and method of forming
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Application No.: US14718466Application Date: 2015-05-21
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Publication No.: US09484301B2Publication Date: 2016-11-01
- Inventor: Max G. Levy , Gary L. Milo , Matthew D. Moon , Anthony C. Speranza , Timothy D. Sullivan , David C. Thomas , Steven S. Williams
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Hoffman Warnick LLC
- Agent David Cain
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L21/768 ; H01L49/02 ; H01L23/522 ; H01L23/532

Abstract:
Aspects of the present invention relate to a controlled metal extrusion opening in a semiconductor structure. Various embodiments include a semiconductor structure. The structure includes an aluminum layer. The aluminum layer includes an aluminum island within the aluminum layer, and a lateral extrusion receiving opening extending through the aluminum layer adjacent the aluminum island. The opening includes a lateral extrusion of the aluminum layer of the semiconductor structure. Additional embodiments include a method of forming a semiconductor structure. The method can include forming an aluminum layer over a titanium layer. The aluminum layer includes an aluminum island within the aluminum layer. The method can also include forming an opening extending through the aluminum layer adjacent the aluminum island within the aluminum layer. The opening includes a lateral extrusion of the aluminum layer of the semiconductor layer.
Public/Granted literature
- US20150255395A1 CONTROLLED METAL EXTRUSION OPENING IN SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING Public/Granted day:2015-09-10
Information query
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