Invention Grant
- Patent Title: Acid generators and photoresists comprising same
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Application No.: US14611768Application Date: 2015-02-02
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Publication No.: US09499513B2Publication Date: 2016-11-22
- Inventor: James F. Cameron , Vipul Jain , Paul J. Labeaume , Jin Wuk Sung , James W. Thackeray
- Applicant: Rohm and Haas Electronic Materials, LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D333/76 ; G03F7/027 ; G03F7/20 ; C07C315/00 ; C07D333/46 ; C08F12/30 ; C08F220/24 ; G03F7/038 ; G03F7/039 ; C07C309/17 ; G03F7/16 ; G03F7/32
Abstract:
Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
Public/Granted literature
- US20160002199A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME Public/Granted day:2016-01-07
Information query
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