Invention Grant
- Patent Title: Photoresist composition and associated method of forming an electronic device
- Patent Title (中): 光刻胶组合物和形成电子器件的相关方法
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Application No.: US14833278Application Date: 2015-08-24
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Publication No.: US09551930B2Publication Date: 2017-01-24
- Inventor: Paul J. LaBeaume , Vipul Jain , Suzanne M. Coley , James W. Thackeray , James F. Cameron , Amy M. Kwok , David A. Valeri
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; C07C309/12 ; C07C381/12 ; C08F220/18 ; C08F220/24 ; C08F220/28 ; C08F220/38 ; G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38 ; H01L21/027
Abstract:
A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
Public/Granted literature
- US09470976B2 Photoresist composition and associated method of forming an electronic device Public/Granted day:2016-10-18
Information query
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