Invention Grant
- Patent Title: Metal hardmask compositions
- Patent Title (中): 金属硬掩模组合物
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Application No.: US14750180Application Date: 2015-06-25
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Publication No.: US09562169B2Publication Date: 2017-02-07
- Inventor: Deyan Wang , Jibin Sun , Peter Trefonas , Kathleen M. O'Connell
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C08K5/00 ; C09D133/14 ; H01L21/027 ; H01L21/033
Abstract:
The invention provides a composition comprising at least the following A and B: A) a polymer comprising, in polymerized from, at least one “monomer that comprises at least one hydroxyl group;” and B) an organometal compound comprising at least one metal selected from Ti, Zr, Hf, Co, Mn, Zn, or combinations thereof, and wherein the organometal compound is present in an amount greater than 5 weight percent, based on the sum weight of A and B.
Public/Granted literature
- US20150291829A1 METAL HARDMASK COMPOSITIONS Public/Granted day:2015-10-15
Information query
IPC分类:
