Invention Grant
- Patent Title: Three-dimensional semiconductor memory devices and methods of fabricating the same
- Patent Title (中): 三维半导体存储器件及其制造方法
-
Application No.: US13972533Application Date: 2013-08-21
-
Publication No.: US09564499B2Publication Date: 2017-02-07
- Inventor: Kwang-Soo Seol , Chanjin Park , Ki-Hyun Hwang , Hanmei Choi , Sunghoi Hur , Wansik Hwang , Toshiro Nakanishi , Kwangmin Park , Ju-Yul Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2010-0027449 20100326; KR10-2010-0055098 20100610; KR10-2010-0064413 20100705; KR10-2010-0064415 20100705; KR10-2010-0084971 20100831
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L21/3213 ; H01L27/06 ; H01L27/115 ; H01L29/792 ; H01L29/51

Abstract:
Three-dimensional semiconductor memory devices and methods of fabricating the same. The three-dimensional semiconductor devices include an electrode structure with sequentially-stacked electrodes disposed on a substrate, semiconductor patterns penetrating the electrode structure, and memory elements including a first pattern and a second pattern interposed between the semiconductor patterns and the electrode structure, the first pattern vertically extending to cross the electrodes and the second pattern horizontally extending to cross the semiconductor patterns.
Public/Granted literature
- US20130334593A1 THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME Public/Granted day:2013-12-19
Information query
IPC分类: