Invention Grant
US09564499B2 Three-dimensional semiconductor memory devices and methods of fabricating the same 有权
三维半导体存储器件及其制造方法

Three-dimensional semiconductor memory devices and methods of fabricating the same
Abstract:
Three-dimensional semiconductor memory devices and methods of fabricating the same. The three-dimensional semiconductor devices include an electrode structure with sequentially-stacked electrodes disposed on a substrate, semiconductor patterns penetrating the electrode structure, and memory elements including a first pattern and a second pattern interposed between the semiconductor patterns and the electrode structure, the first pattern vertically extending to cross the electrodes and the second pattern horizontally extending to cross the semiconductor patterns.
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