Invention Grant
- Patent Title: Reduced scale resonant tunneling field effect transistor
- Patent Title (中): 缩小谐振隧道场效应晶体管
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Application No.: US14942274Application Date: 2015-11-16
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Publication No.: US09583566B2Publication Date: 2017-02-28
- Inventor: Uygar E. Avci , Dmitri E. Nikonov , Ian A. Young
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Trop, Pruner & Hu, P.C.
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/772 ; H01L29/267 ; H01L29/739 ; H01L29/165 ; H01L29/205 ; H01L29/08 ; H01L29/10 ; H01L29/775 ; B82Y10/00

Abstract:
An embodiment includes a heterojunction tunneling field effect transistor including a source, a channel, and a drain; wherein (a) the channel includes a major axis, corresponding to channel length, and a minor axis that corresponds to channel width and is orthogonal to the major axis; (b) the channel length is less than 10 nm long; (c) the source is doped with a first polarity and has a first conduction band; (d) the drain is doped with a second polarity, which is opposite the first polarity, and the drain has a second conduction band with higher energy than the first conduction band. Other embodiments are described herein.
Public/Granted literature
- US20160133699A1 Reduced Scale Resonant Tunneling Field Effect Transistor Public/Granted day:2016-05-12
Information query
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