Invention Grant
- Patent Title: Apparatus and method for drying substrate
- Patent Title (中): 基材干燥装置及方法
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Application No.: US13905676Application Date: 2013-05-30
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Publication No.: US09587880B2Publication Date: 2017-03-07
- Inventor: Boong Kim , Ki Bong Kim , Gil Hun Song , Oh Jin Kwon
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Carter, DeLuca, Farrell & Schmidt, LLP
- Priority: KR10-2012-0058233 20120531; KR10-2012-0091456 20120821
- Main IPC: F26B21/12
- IPC: F26B21/12 ; F26B5/00 ; H01L21/67

Abstract:
Provided is an apparatus and method for drying a substrate. The apparatus includes a housing, a substrate support member, a fluid supply member, and a discharge member. The housing provides a space in which a drying process is performed. The substrate support member is provided in the housing to support the substrate. The fluid supply member includes a supply line for supplying a process fluid of a supercritical state to the housing. The discharge member includes a discharge line for discharging the process fluid from the housing. Here, the supply line includes a first supply line provided to supply the process fluid to the housing at a first supply flow rate, and a second supply line provided to supply the process fluid to the housing at a second supply flow rate.
Public/Granted literature
- US20130318812A1 APPARATUS AND METHOD FOR DRYING SUBSTRATE Public/Granted day:2013-12-05
Information query
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