Invention Grant
- Patent Title: Wafer rotation in a semiconductor chamber
- Patent Title (中): 晶圆在半导体室内旋转
-
Application No.: US14632648Application Date: 2015-02-26
-
Publication No.: US09593419B2Publication Date: 2017-03-14
- Inventor: Ganesh Balasubramanian , Juan Carlos Rocha-Alvarez , Ramprakash Sankarakrishnan , Robert Kim , Dale R. Du Bois , Kirby Hane Floyd , Amit Kumar Bansal , Tuan Anh Nguyen
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/687 ; C23C16/458 ; C23C16/509 ; H01J37/32
Abstract:
A method and apparatus for processing a substrate are provided. The apparatus includes a pedestal and rotation member, both of which are moveably disposed within a processing chamber. The rotation member is adapted to rotate a substrate disposed in the chamber. The substrate may be supported by an edge ring during processing. The edge ring may selectively engage either the pedestal or the rotation member. In one embodiment, the edge ring engages the pedestal during a deposition process and the edge ring engages the rotation member during rotation of the substrate. The rotation of the substrate during processing may be discrete or continuous.
Public/Granted literature
- US20150262859A1 WAFER ROTATION IN A SEMICONDUCTOR CHAMBER Public/Granted day:2015-09-17
Information query
IPC分类:
