Invention Grant
- Patent Title: Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same
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Application No.: US14878713Application Date: 2015-10-08
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Publication No.: US09607807B2Publication Date: 2017-03-28
- Inventor: Akio Yamada , Tatsuro Okawa , Masahiro Seyama , Masaki Kurokawa
- Applicant: ADVANTEST CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Advantest Corp.
- Current Assignee: Advantest Corp.
- Current Assignee Address: JP Tokyo
- Agency: Muramatsu & Associates
- Priority: JP2014-229726 20141112
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/304 ; H01J37/317 ; H01J37/20

Abstract:
There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.
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