公开(公告)号：US09607807B2

公开(公告)日：2017-03-28

申请号：US14878713

申请日：2015-10-08

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Tatsuro Okawa ,  Masahiro Seyama ,  Masaki Kurokawa

IPC: H01J37/00 ,  H01J37/304 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31761

Abstract: There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.

公开(公告)号：US20160133438A1

公开(公告)日：2016-05-12

申请号：US14878713

申请日：2015-10-08

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Tatsuro Okawa ,  Masahiro Seyama ,  Masaki Kurokawa

IPC: H01J37/304 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31761

Abstract: There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.

Abstract translation: 提供了一种带电粒子束曝光装置，其将包括多个带电粒子束的阵列束在预定的消隐时刻沿着与线图案交叉的方向一行地并排设置，并且因此在 带电粒子束的照射位置到达图案位置。 带电粒子束曝光装置通过将具有线图案的样本分割成在移动方向上以预定长度分布的多个曝光范围来改进数据处理控制，并且基于时间点执行光束的开关控制 当阵列光束通过设置在曝光区域中的基准位置时。