Invention Grant
- Patent Title: Plasma ion source for use with a focused ion beam column with selectable ions
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Application No.: US14804148Application Date: 2015-07-20
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Publication No.: US09627169B2Publication Date: 2017-04-18
- Inventor: Anthony Graupera , Charles Otis
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, P.C.
- Agent Michael O. Scheinberg
- Main IPC: H01J37/05
- IPC: H01J37/05 ; H01J37/317 ; H01J37/08
Abstract:
An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.
Public/Granted literature
- US20160027607A1 INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BEAM COLUMN WITH SELECTABLE IONS Public/Granted day:2016-01-28
Information query
