Invention Grant
- Patent Title: Etching apparatus and methods
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Application No.: US14195887Application Date: 2014-03-04
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Publication No.: US09640370B2Publication Date: 2017-05-02
- Inventor: Oliver James Ansell
- Applicant: SPTS TECHNOLOGIES LIMITED
- Applicant Address: GB Newport
- Assignee: SPTS Technologies Limited
- Current Assignee: SPTS Technologies Limited
- Current Assignee Address: GB Newport
- Agency: Volentine & Whitt, PLLC
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/66 ; B81C99/00

Abstract:
A method is for etching the whole width of a substrate to expose buried features. The method includes etching a face of a substrate across its width to achieve substantially uniform removal of material; illuminating the etched face during the etch process; applying edge detection techniques to light reflected or scattered from the face to detect the appearances of buried features; and modifying the etch in response to the detection of the buried feature. An etching apparatus for etching substrate across its width to expose buried is also disclosed.
Public/Granted literature
- US20140174658A1 ETCHING APPARATUS AND METHODS Public/Granted day:2014-06-26
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