Invention Grant
- Patent Title: Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
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Application No.: US14664770Application Date: 2015-03-20
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Publication No.: US09690204B2Publication Date: 2017-06-27
- Inventor: Sang-Hyun Lee , Hyun-Seok Kim , Jung-Chul Heo , Hi-Kuk Lee , Sang-Hyun Yun , Ki-Beom Lee , Chang-Hoon Kim , Jung-In Park , Kab-Jong Seo , Jun-Ho Sim , Jae-Hyuk Chang
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2014-0110922 20140825
- Main IPC: G03B27/44
- IPC: G03B27/44 ; G03B27/68 ; G03F7/20 ; H01L29/786 ; H01L27/12 ; H01L29/417

Abstract:
A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
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