Invention Grant
- Patent Title: Composition and method for polishing bulk silicon
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Application No.: US14509081Application Date: 2014-10-08
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Publication No.: US09701871B2Publication Date: 2017-07-11
- Inventor: Brian Reiss , John Clark , Lamon Jones , Jeffrey Gilliland , Michael White
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt; Erika Wilson; Francis J. Koszyk
- Main IPC: C09K13/06
- IPC: C09K13/06 ; C09G1/02 ; C09K3/14 ; H01L21/02
Abstract:
The invention provides a polishing composition comprising (a) silica, (b) one or more compounds that increases the removal rate of silicon, (c) one or more tetraalkylammonium salts, and (d) water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.
Public/Granted literature
- US20150028254A1 COMPOSITION AND METHOD FOR POLISHING BULK SILICON Public/Granted day:2015-01-29
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