Invention Grant
- Patent Title: Aerosol deposition coating for semiconductor chamber components
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Application No.: US14282824Application Date: 2014-05-20
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Publication No.: US09708713B2Publication Date: 2017-07-18
- Inventor: Jennifer Y. Sun , Biraja Kanungo , Tom Cho , Ying Zhang
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: C23C24/04
- IPC: C23C24/04 ; H01J37/32
Abstract:
A method for coating a component for use in a semiconductor chamber for plasma etching includes providing the component and loading the component in a deposition chamber. A pressure in the deposition chamber is reduced to below atmospheric pressure. A coating is deposited on the component by spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature.
Public/Granted literature
- US20140349073A1 AEROSOL DEPOSITION COATING FOR SEMICONDUCTOR CHAMBER COMPONENTS Public/Granted day:2014-11-27
Information query
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