Invention Grant
- Patent Title: Systems and methods for providing gases to a process chamber
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Application No.: US14753738Application Date: 2015-06-29
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Publication No.: US09721763B2Publication Date: 2017-08-01
- Inventor: Iqbal Shareef , Mark Taskar , Evangelos Spyropoulos
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: US CA Fremont
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: US CA Fremont
- Main IPC: F16K11/16
- IPC: F16K11/16 ; H01J37/32 ; G05D11/13 ; G05D7/06 ; C23C16/455 ; C23C16/513 ; H01L21/67

Abstract:
A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.
Public/Granted literature
- US20150303035A1 SYSTEMS AND METHODS FOR PROVIDING GASES TO A PROCESS CHAMBER Public/Granted day:2015-10-22
Information query