公开(公告)号：US20140182689A1

公开(公告)日：2014-07-03

申请号：US13732054

申请日：2012-12-31

Applicant: LAM RESEARCH CORPORATION

Inventor： Iqbal Shareef ,  Mark Taskar ,  Evangelos Spyropoulos

IPC: H01L21/67

CPC classification number: H01J37/32449 ,  C23C16/45561 ,  C23C16/513 ,  G05D7/06 ,  G05D7/0658 ,  G05D11/132 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/67069 ,  Y10T137/0324 ,  Y10T137/7722

Abstract: A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers. Pump-purge may be employed to improve gas switching speed for the multi-gas mass flow controllers

Abstract translation: 一种用于向衬底处理室提供一组工艺气体的气体供应子系统，该组工艺气体是可用于衬底处理室的多个工艺气体的子集。 气体供应子系统具有比可用的工艺气体的数量少的多气体质量流量控制器，其中多个处理气体在多个气体质量流量控制器的一个或多个的输入处被多路复用。 可以采用泵清洗来提高多气体质量流量控制器的气体切换速度

公开(公告)号：US09778083B2

公开(公告)日：2017-10-03

申请号：US13896108

申请日：2013-05-16

Applicant: Lam Research Corporation

Inventor： Evangelos Spyropoulos ,  Iqbal Shareef

IPC: G01F25/00 ,  G01F1/34

CPC classification number: G01F1/34 ,  B01J2219/00216 ,  G01F25/0007 ,  G01F25/0038 ,  G01F25/0092

Abstract: A method of calculating a transient flow rate of a flowed process gas comprises flowing process gas through a mass flow controller into a chamber of known volume and measuring successive data sample points which include pressure data, temperature data, and a time value for each successive data sample point. Groups of successive data sample points are identified wherein each group shares one or more successive data sample points with another group, and ratio values are calculated for each of the successive data sample points wherein each ratio value is a ratio between the pressure data and a product of temperature and gas compressibility data for each respective time value. A line of best fit of the ratio values is determined within at least one group, and then the transient flow rate of the flowed process gas is calculated using a pressure rate of rise technique wherein the pressure rate of rise technique utilizes a ratio value determined from the line of best fit for at least one time value within the at least one group.

公开(公告)号：US20150303035A1

公开(公告)日：2015-10-22

申请号：US14753738

申请日：2015-06-29

Applicant: LAM RESEARCH CORPORATION

Inventor： Iqbal Shareef ,  Mark Taskar ,  Evangelos Spyropoulos

IPC: H01J37/32 ,  C23C16/513 ,  H01L21/67

CPC classification number: H01J37/32449 ,  C23C16/45561 ,  C23C16/513 ,  G05D7/06 ,  G05D7/0658 ,  G05D11/132 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/67069 ,  Y10T137/0324 ,  Y10T137/7722

Abstract: A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.

Abstract translation: 用于向处理室提供多个处理气体的气体供应系统包括多个质量流量控制器，每个质量流量控制器被布置成接收多个处理气体的相应子集。 各个子集中的每一个包括多于一个的处理气体，并且至少一个处理气体被提供给多个质量流量控制器中的一个以上。 各个阀布置在多个质量流量控制器中的每一个的上游，以选择性地向质量流量控制器提供相应的子集。 多个质量流量控制器的第一数量少于要供应到处理室的多个处理气体的总数。 第一数量等于在任何一个时间在处理室中使用的多种处理气体的最大数量。

公开(公告)号：US09721763B2

公开(公告)日：2017-08-01

申请号：US14753738

申请日：2015-06-29

Applicant: LAM RESEARCH CORPORATION

Inventor： Iqbal Shareef ,  Mark Taskar ,  Evangelos Spyropoulos

IPC: F16K11/16 ,  H01J37/32 ,  G05D11/13 ,  G05D7/06 ,  C23C16/455 ,  C23C16/513 ,  H01L21/67

CPC classification number: H01J37/32449 ,  C23C16/45561 ,  C23C16/513 ,  G05D7/06 ,  G05D7/0658 ,  G05D11/132 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/67069 ,  Y10T137/0324 ,  Y10T137/7722

Abstract: A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.

公开(公告)号：US09090972B2

公开(公告)日：2015-07-28

申请号：US13732054

申请日：2012-12-31

Applicant: LAM RESEARCH CORPORATION

Inventor： Iqbal Shareef ,  Mark Taskar ,  Evangelos Spyropoulos

IPC: F16K11/16 ,  C23C16/455 ,  G05D11/13 ,  G05D7/06

CPC classification number: H01J37/32449 ,  C23C16/45561 ,  C23C16/513 ,  G05D7/06 ,  G05D7/0658 ,  G05D11/132 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/67069 ,  Y10T137/0324 ,  Y10T137/7722

Abstract: A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers. Pump-purge may be employed to improve gas switching speed for the multi-gas mass flow controllers.

Abstract translation: 一种用于向衬底处理室提供一组工艺气体的气体供应子系统，该组工艺气体是可用于衬底处理室的多个工艺气体的子集。 气体供应子系统具有比可用的工艺气体的数量少的多气体质量流量控制器，其中多个处理气体在多个气体质量流量控制器的一个或多个的输入处被多路复用。 可以采用泵清洗来提高多气体质量流量控制器的气体切换速度。

公开(公告)号：US20140343875A1

公开(公告)日：2014-11-20

申请号：US13896108

申请日：2013-05-16

Applicant: Lam Research Corporation

Inventor： Evangelos Spyropoulos ,  Iqbal Shareef

IPC: G01F1/34

CPC classification number: G01F1/34 ,  B01J2219/00216 ,  G01F25/0007 ,  G01F25/0038 ,  G01F25/0092

Abstract: A method of calculating a transient flow rate of a flowed process gas comprises flowing process gas through a mass flow controller into a chamber of known volume and measuring successive data sample points which include pressure data, temperature data, and a time value for each successive data sample point. Groups of successive data sample points are identified wherein each group shares one or more successive data sample points with another group, and ratio values are calculated for each of the successive data sample points wherein each ratio value is a ratio between the pressure data and a product of temperature and gas compressibility data for each respective time value. A line of best fit of the ratio values is determined within at least one group, and then the transient flow rate of the flowed process gas is calculated using a pressure rate of rise technique wherein the pressure rate of rise technique utilizes a ratio value determined from the line of best fit for at least one time value within the at least one group.

Abstract translation: 一种计算流动工艺气体的瞬态流量的方法包括使工艺气体通过质量流量控制器流入已知体积的腔室并测量连续的数据采样点，其包括压力数据，温度数据和每个连续数据的时间值 采样点。 识别连续数据采样点的组，其中每个组与另一组共享一个或多个连续的数据采样点，并且为每个连续数据采样点计算每个连续数据采样点的比值，其中每个比值是压力数据和乘积之间的比率 的每个时间值的温度和气体压缩性数据。 在至少一组内确定比值的最佳拟合线，然后使用上升技术的压力比计算流动过程气体的瞬时流量，其中上升压力的技术利用从 该线最适合至少一个组内的至少一个时间值。