- Patent Title: Delamination method, delamination device, and delamination system
-
Application No.: US14633393Application Date: 2015-02-27
-
Publication No.: US09724906B2Publication Date: 2017-08-08
- Inventor: Masanori Itou , Ryoichi Sakamoto , Takashi Sakaue
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2014-036760 20140227
- Main IPC: B32B38/10
- IPC: B32B38/10 ; B32B43/00 ; H01L21/67 ; H01L21/683

Abstract:
A delamination method for delaminating a laminated substrate which includes a first and a second substrates bonded to each other, includes: adjusting a position of the laminated substrate at a holding unit by a position adjusting unit and disposing the holding unit at a predetermined height position; disposing a sharp member of a delamination inducing unit at a predetermined height position; detecting a contact of the sharp member by bringing the sharp member into contact with a side surface of one end portion of the laminated substrate; inserting the sharp member into the side surface of the one end portion of the laminated substrate; and delaminating the second substrate from the first substrate by a plurality of suction movement units which sucks the second substrate of the laminated substrate to move the second substrate away from the first substrate.
Public/Granted literature
- US20150239227A1 DELAMINATION METHOD, DELAMINATION DEVICE, AND DELAMINATION SYSTEM Public/Granted day:2015-08-27
Information query