- 专利标题: Delamination method, delamination device, and delamination system
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申请号: US14633393申请日: 2015-02-27
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公开(公告)号: US09724906B2公开(公告)日: 2017-08-08
- 发明人: Masanori Itou , Ryoichi Sakamoto , Takashi Sakaue
- 申请人: TOKYO ELECTRON LIMITED
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Nath, Goldberg & Meyer
- 代理商 Jerald L. Meyer
- 优先权: JP2014-036760 20140227
- 主分类号: B32B38/10
- IPC分类号: B32B38/10 ; B32B43/00 ; H01L21/67 ; H01L21/683
摘要:
A delamination method for delaminating a laminated substrate which includes a first and a second substrates bonded to each other, includes: adjusting a position of the laminated substrate at a holding unit by a position adjusting unit and disposing the holding unit at a predetermined height position; disposing a sharp member of a delamination inducing unit at a predetermined height position; detecting a contact of the sharp member by bringing the sharp member into contact with a side surface of one end portion of the laminated substrate; inserting the sharp member into the side surface of the one end portion of the laminated substrate; and delaminating the second substrate from the first substrate by a plurality of suction movement units which sucks the second substrate of the laminated substrate to move the second substrate away from the first substrate.
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