Invention Grant
- Patent Title: Systems and methods of local focus error compensation for semiconductor processes
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Application No.: US14656754Application Date: 2015-03-13
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Publication No.: US09735065B2Publication Date: 2017-08-15
- Inventor: Chia-Hao Hsu , Pei-Cheng Hsu , Chia-Ching Huang , Chih-Ming Chen , Chia-Chen Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L21/66 ; H01L21/02 ; G03F1/00 ; H01L21/311 ; H01L21/3205 ; H01L21/321 ; H01L21/3213
Abstract:
A system and method of compensating for local focus errors in a semiconductor process. The method includes providing a reticle and applying, at a first portion of the reticle, a step height based on an estimated local focus error for a first portion of a wafer corresponding to the first portion of the reticle. A multilayer coating is formed over the reticle and an absorber layer is formed over the multilayer coating. A photoresist is formed over the absorber layer. The photoresist is patterned, an etch is performed of the absorber layer and residual photoresist is removed.
Public/Granted literature
- US20150187663A1 SYSTEMS AND METHODS OF LOCAL FOCUS ERROR COMPENSATION FOR SEMICONDUCTOR PROCESSES Public/Granted day:2015-07-02
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