Invention Grant
- Patent Title: Film forming method, computer storage medium, and film forming system
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Application No.: US14764687Application Date: 2014-01-23
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Publication No.: US09741559B2Publication Date: 2017-08-22
- Inventor: Satoru Shimura , Fumiko Iwao , Kousuke Yoshihara
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2013-033216 20130222
- International Application: PCT/JP2014/051361 WO 20140123
- International Announcement: WO2014/129259 WO 20140828
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B05C9/12 ; B05C9/14 ; B05C11/10 ; H01L21/66 ; H01L21/3105 ; H01L21/311 ; H01L21/67 ; H01L21/027 ; B05C11/08
Abstract:
The present invention is to form an organic film on a substrate having a pattern formed on a front surface thereof and configured to: apply an organic material onto the substrate; then thermally treat the organic material to form an organic film on the substrate; and then perform ultraviolet irradiation processing on the organic film to remove a surface of the organic film down to a predetermined depth, thereby appropriately and efficiently form the organic film on the substrate.
Public/Granted literature
- US20150357188A1 FILM FORMING METHOD, COMPUTER STORAGE MEDIUM, AND FILM FORMING SYSTEM Public/Granted day:2015-12-10
Information query
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