Invention Grant
- Patent Title: Low voltage avalanche photodiode with re-entrant mirror for silicon based photonic integrated circuits
-
Application No.: US13976369Application Date: 2013-03-11
-
Publication No.: US09761746B2Publication Date: 2017-09-12
- Inventor: Yimin Kang , Han-Din D. Liu , Ansheng Liu
- Applicant: Yimin Kang , Han-Din D. Liu , Ansheng Liu
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- International Application: PCT/US2013/030288 WO 20130311
- International Announcement: WO2014/142795 WO 20140918
- Main IPC: H01S5/02
- IPC: H01S5/02 ; H01L31/107 ; H01L31/028 ; H01L31/0232 ; G02B6/26 ; H01L35/24 ; G02B6/12 ; H01L31/105 ; H01L31/18

Abstract:
A low voltage APD is disposed at an end of a waveguide extending laterally within a silicon device layer of a PIC chip. The APD is disposed over an inverted re-entrant mirror co-located at the end of the waveguide to couple light by internal reflection from the waveguide to an under side of the APD. In exemplary embodiments, a 45°-55° facet is formed in the silicon device layer by crystallographic etch. In embodiments, the APD includes a silicon multiplication layer, a germanium absorption layer over the multiplication layer, and a plurality of ohmic contacts disposed over the absorption layer. An overlying optically reflective metal film interconnects the plurality of ohmic contacts and returns light transmitted around the ohmic contacts to the absorption layer for greater detector responsivity.
Public/Granted literature
- US20140252411A1 LOW VOLTAGE AVALANCHE PHOTODIODE WITH RE-ENTRANT MIRROR FOR SILICON BASED PHOTONIC INTEGRATED CIRCUITS Public/Granted day:2014-09-11
Information query