Invention Grant
- Patent Title: Liquid processing apparatus
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Application No.: US14483252Application Date: 2014-09-11
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Publication No.: US09773687B2Publication Date: 2017-09-26
- Inventor: Terufumi Wakiyama , Norihiro Ito , Jiro Higashijima
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2013-201972 20130927; JP2014-157879 20140801
- Main IPC: B08B3/02
- IPC: B08B3/02 ; H01L21/67 ; B08B17/00

Abstract:
A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion.
Public/Granted literature
- US20150090305A1 LIQUID PROCESSING APPARATUS Public/Granted day:2015-04-02
Information query
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