- Patent Title: Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom
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Application No.: US14482251Application Date: 2014-09-10
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Publication No.: US09783882B2Publication Date: 2017-10-10
- Inventor: Steven A. Miller , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann , Olaf Schmidt-Park
- Applicant: H.C. Starck, Inc.
- Applicant Address: US MA Newton DE Goslar
- Assignee: H.C. Starck Inc.,H.C. Starck GmbH
- Current Assignee: H.C. Starck Inc.,H.C. Starck GmbH
- Current Assignee Address: US MA Newton DE Goslar
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/34 ; B22F1/00 ; C22C1/04 ; C23C24/04 ; C23C14/00 ; C23C14/14 ; C23C4/134
Abstract:
In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.
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