- 专利标题: Wafer holder and temperature conditioning arrangement and method of manufacturing a wafer
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申请号: US13220903申请日: 2011-08-30
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公开(公告)号: US09793144B2公开(公告)日: 2017-10-17
- 发明人: Juergen Kielwein , Bart Scholte Von Mast , Rogier Lodder
- 申请人: Juergen Kielwein , Bart Scholte Von Mast , Rogier Lodder
- 申请人地址: CH Trübbach
- 专利权人: EVATEC AG
- 当前专利权人: EVATEC AG
- 当前专利权人地址: CH Trübbach
- 代理机构: Pearne & Gordon LLP
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/67
摘要:
A wafer holder and temperature controlling arrangement has a metal circular wafer carrier plate, which covers a heater compartment. In the heater compartment a multitude of heater lamp tubes is arranged, which directly acts upon the circular wafer carrier plate. Latter is drivingly rotatable about the central axis. A wafer is held on the circular wafer carrier plate by means of a weight-ring residing upon the periphery of a wafer deposited on the wafer carrier plate.
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