Invention Grant
- Patent Title: Magnetoresistance effect element
-
Application No.: US15258096Application Date: 2016-09-07
-
Publication No.: US09853207B2Publication Date: 2017-12-26
- Inventor: Takuya Seino , Kazumasa Nishimura , Toshikazu Irisawa , Saki Shibuichi
- Applicant: CANON ANELVA CORPORATION
- Applicant Address: JP Kawasaki-Shi
- Assignee: CANON ANELVA CORPORATION
- Current Assignee: CANON ANELVA CORPORATION
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2015-104341 20150522
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01L43/08 ; G01R33/09 ; G11C11/16 ; H01F10/32 ; H01L43/12

Abstract:
A magnetoresistance effect element of the present invention includes: a barrier layer; a reference layer formed on one surface of the barrier layer; a free layer formed on the other surface of the barrier layer; and a pinned layer placed on the opposite side of the reference layer from the barrier layer. The pinned layer includes a structure obtained by stacking Ni, Co, Pt, Co, Ru, Co, Pt, Co, and Ni layers in this order.
Public/Granted literature
- US20160380187A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2016-12-29
Information query
IPC分类: