- 专利标题: Semiconductor manufacturing device and processing method
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申请号: US14238860申请日: 2012-08-13
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公开(公告)号: US09859146B2公开(公告)日: 2018-01-02
- 发明人: Shinji Himori , Yoshiyuki Kobayashi , Takehiro Kato , Etsuji Ito
- 申请人: Shinji Himori , Yoshiyuki Kobayashi , Takehiro Kato , Etsuji Ito
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Rothwell, Figg, Ernst & Manbeck, P.C.
- 优先权: JP2011-178494 20110817
- 国际申请: PCT/JP2012/070630 WO 20120813
- 国际公布: WO2013/024842 WO 20130221
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/687 ; H01L21/306 ; H01L21/67
摘要:
A semiconductor manufacturing device includes a stage, a plurality of pins, and a driving unit. The stage includes a mounting surface. The mounting surface has a first region for mounting thereon a substrate, and a second region for mounting thereon a focus ring. The second region is provided to surround the first region. A plurality of holes is formed in the stage. The holes extend in a direction that intersects the mounting surface while passing through the boundary between the first region and the second region. The pins are provided in the respective holes. Each of the pins has a first and a second upper end surface. The second upper end surface is provided above the first upper end surface, and is offset towards the first region with respect to the first upper end surface. The driving unit moves the pins up and down in the aforementioned direction.
公开/授权文献
- US20140213055A1 SEMICONDUCTOR MANUFACTURING DEVICE AND PROCESSING METHOD 公开/授权日:2014-07-31
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