Invention Grant
- Patent Title: Method for repairing a mask
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Application No.: US15254607Application Date: 2016-09-01
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Publication No.: US09870612B2Publication Date: 2018-01-16
- Inventor: Shinn-Sheng Yu , Anthony Yen , Wen-Chuan Wang , Sheng-Chi Chin
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; H01L21/027 ; G03F1/72 ; G03F1/24 ; G03F1/26

Abstract:
A method includes inspecting a mask to locate a defect region for a defect of the mask. A phase distribution of an aerial image of the defect region is acquired. A point spread function of an imaging system is determined. One or more repair regions of the mask are identified based on the phase distribution of the aerial image of the defect region and the point spread function. A repair process is performed to the one or more repair regions of the mask to form one or more repair features.
Public/Granted literature
- US20170352144A1 METHOD FOR REPAIRING A MASK Public/Granted day:2017-12-07
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