Disclosed is a substrate liquid processing apparatus including a processing liquid storage unit that stores a processing liquid; a processing liquid supply unit that supplies the processing liquid to the processing liquid storage unit; a processing liquid circulation unit that circulates the processing liquid inside the processing liquid storage unit; a processing liquid discharge unit that discharges the processing liquid; a concentration sensor that measures a concentration in the processing liquid; and a controller that controls the processing liquid supply unit. The controller controls the processing liquid circulation unit to circulate the processing liquid, the processing liquid discharge unit to discharge the circulated processing liquid intermittently at a predetermined timing or continuously for a predetermined period of time, the processing liquid supply unit to newly supply the processing liquid, and the concentration sensor to measure the concentration in the processing liquid at a predetermined timing.