- 专利标题： Hard mask composition for spin-coating
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申请号： US14996481申请日： 2016-01-15
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公开(公告)号： US09899231B2公开(公告)日： 2018-02-20
- 发明人: Jung-hoon Kim , Nae-ry Yu , Boo-deuk Kim , Song-se Yi , Jung-sik Choi
- 申请人： Samsung Electronics Co., Ltd.
- 申请人地址： KR
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR
- 代理机构： Ward and Smith, P.A.
- 优先权： KR10-2015-0008261 20150116
- 主分类号： H01L21/308
- IPC分类号： H01L21/308 ; H01L21/311 ; G03F7/40 ; H01L21/02 ; H01L21/033 ; G03F7/11
摘要：
Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased aspect ratio may also be performed on a mask having a smaller thickness.
公开/授权文献
- US20160211142A1 HARD MASK COMPOSITION FOR SPIN-COATING 公开/授权日：2016-07-21
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