Invention Grant
- Patent Title: System for depositing one or more layers on a substrate supported by a carrier and method using the same
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Application No.: US15113752Application Date: 2014-02-04
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Publication No.: US09899635B2Publication Date: 2018-02-20
- Inventor: Stefan Bangert , Uwe Schüβler , Jose Manuel Dieguez-Campo , Dieter Haas
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- International Application: PCT/EP2014/052116 WO 20140204
- International Announcement: WO2015/117638 WO 20150813
- Main IPC: H01L51/40
- IPC: H01L51/40 ; H01L51/56 ; C23C14/04 ; C23C14/12 ; C23C14/24 ; C23C14/50 ; C23C14/56 ; H01L51/00

Abstract:
A system for depositing one or more layers, particularly layers including organic materials therein, is described. The system includes a load lock chamber for loading a substrate to be processed, a transfer chamber for transporting the substrate, a vacuum swing module provided between the load lock chamber and the transfer chamber, at least one deposition apparatus for depositing material in a vacuum chamber of the at least one deposition chamber, wherein the at least one deposition apparatus is connected to the transfer chamber; a further load lock chamber for unloading the substrate that has been processed, a further transfer chamber for transporting the substrate, a further vacuum swing module provided between the further load lock chamber and the further transfer chamber, and a carrier return track from the further vacuum swing module to the vacuum swing module, wherein the carrier return track is configured to transport the carrier under vacuum conditions and/or under a controlled inert atmosphere.
Public/Granted literature
- US20170244070A1 SYSTEM FOR DEPOSITING ONE OR MORE LAYERS ON A SUBSTRATE SUPPORTED BY A CARRIER AND METHOD USING THE SAME Public/Granted day:2017-08-24
Information query
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