Invention Grant
- Patent Title: Peeling device, peeling system and peeling method
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Application No.: US13977134Application Date: 2011-12-16
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Publication No.: US09919509B2Publication Date: 2018-03-20
- Inventor: Osamu Hirakawa , Naoto Yoshitaka , Masaru Honda , Xavier Francois Brun , Charles Wayne Singleton, Jr.
- Applicant: Osamu Hirakawa , Naoto Yoshitaka , Masaru Honda , Xavier Francois Brun , Charles Wayne Singleton, Jr.
- Applicant Address: JP Tokyo US CA Santa Clara
- Assignee: TOKYO ELECTRON LIMITED,INTEL CORPORATION
- Current Assignee: TOKYO ELECTRON LIMITED,INTEL CORPORATION
- Current Assignee Address: JP Tokyo US CA Santa Clara
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2011-002560 20110107
- International Application: PCT/JP2011/079187 WO 20111216
- International Announcement: WO2012/093574 WO 20120712
- Main IPC: B32B43/00
- IPC: B32B43/00 ; H01L21/67 ; H01L21/687 ; B32B38/10 ; B32B37/06 ; B32B41/00

Abstract:
A peeling device for peeling off a substrate to be processed and a support substrate from an overlapped substrate, the overlapped substrate being formed by bonding the substrate to be processed and the support substrate by an adhesive, which includes: a first holding unit configured to heat the substrate to be processed and configured to hold the substrate to be processed; a second holding unit configured to heat the support substrate and configured to hold the support substrate; a moving mechanism configured to horizontally move at least one of the first holding unit and the second holding unit relative to each other; and an inert gas supply mechanism configured to supply an inert gas onto a bonding surface of the substrate to be processed or a bonding surface of the support substrate.
Public/Granted literature
- US20130269879A1 PEELING DEVICE, PEELING SYSTEM AND PEELING METHOD Public/Granted day:2013-10-17
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