- 专利标题: Reducing select gate injection disturb at the beginning of an erase operation
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申请号: US15621222申请日: 2017-06-13
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公开(公告)号: US09922705B1公开(公告)日: 2018-03-20
- 发明人: Vinh Diep , Xuehong Yu , Zhengyi Zhang , Yingda Dong
- 申请人: SanDisk Technologies LLC
- 申请人地址: US TX Plano
- 专利权人: SanDisk Technologies LLC
- 当前专利权人: SanDisk Technologies LLC
- 当前专利权人地址: US TX Plano
- 代理机构: Vierra Magen Marcus LLP
- 主分类号: G11C11/34
- IPC分类号: G11C11/34 ; G11C11/56 ; G11C16/34 ; G11C16/04 ; G11C16/14
摘要:
A memory device and associated techniques avoid a disturb of a select gate transistor during an erase operation for memory cells in a string. During the erase operation, a channel gradient near the select gate transistors is reduced when the voltages of the drain and source ends of a memory string are increased to an erase level which charges up the channel. In one approach, the voltage of the word line which is adjacent to a select gate line is temporarily increased. Another approach builds off the first approach by temporarily increasing the voltage of the select gate line at the same time as the increase in the word line voltage.
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