Invention Grant
- Patent Title: Method for producing functional device and apparatus for producing functional device
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Application No.: US14357138Application Date: 2012-11-07
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Publication No.: US09929188B2Publication Date: 2018-03-27
- Inventor: Tatsuya Shimoda , Toshihiko Kaneda
- Applicant: Japan Science and Technology Agency
- Applicant Address: JP Saitama
- Assignee: Japan Science and Technology Agency
- Current Assignee: Japan Science and Technology Agency
- Current Assignee Address: JP Saitama
- Agency: Seed IP Law Group LLP
- Priority: JP2011-245922 20111109
- International Application: PCT/JP2012/078849 WO 20121107
- International Announcement: WO2013/069686 WO 20130516
- Main IPC: B44C1/22
- IPC: B44C1/22 ; H01L27/12 ; H01L45/00 ; H01L41/09 ; H01L41/317 ; H01L41/332 ; H01L29/786 ; B41J2/16 ; H01L21/67 ; H01L27/108 ; H01L21/28 ; H01L29/78 ; H01L49/02

Abstract:
According to the present invention, a method of producing a functional device includes the imprinting step and the functional solid material layer formation step. In the imprinting step, a functional solid material precursor layer obtained from a functional solid material precursor solution as a start material is imprinted so that a first temperature of a heat source for supplying heat to the functional solid material precursor layer is higher than a second temperature of the functional solid material precursor layer in at least part of a time period while a mold for forming an imprinted structure is pressed against the functional solid material precursor layer. In the functional solid material layer formation step, after the imprinting step, the functional solid material precursor layer is heat treated at a third temperature higher than the first temperature in an atmosphere containing oxygen to form a functional solid material layer from the functional solid material precursor layer.
Public/Granted literature
- US20150004762A1 METHOD FOR PRODUCING FUNCTIONAL DEVICE AND APPARATUS FOR PRODUCING FUNCTIONAL DEVICE Public/Granted day:2015-01-01
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