- 专利标题: Substrate with buffer layer for oriented nanowire growth
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申请号: US13805273申请日: 2011-06-27
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公开(公告)号: US09947829B2公开(公告)日: 2018-04-17
- 发明人: Jonas Ohlsson
- 申请人: Jonas Ohlsson
- 申请人地址: SE Lund
- 专利权人: GLO AB
- 当前专利权人: GLO AB
- 当前专利权人地址: SE Lund
- 代理机构: The Marbury Law Group PLLC
- 优先权: SE1050700 20100624
- 国际申请: PCT/SE2011/050845 WO 20110627
- 国际公布: WO2011/162715 WO 20111229
- 主分类号: H01L33/12
- IPC分类号: H01L33/12 ; B82Y10/00 ; H01L29/06 ; H01L33/18 ; H01L21/02 ; B82Y20/00 ; B82Y40/00 ; H01L33/00 ; H01L33/06 ; H01L33/08 ; H01L33/24 ; B82Y99/00
摘要:
The present invention provides a substrate (1) with a bulk layer (3) and a buffer layer (4) having a thickness of less than 2 μm arranged on the bulk layer (3) for growth of a multitude of nanowires (2) oriented in the same direction on a surface (5) of the buffer layer (4). A nanowire structure, a nanowire light emitting diode comprising the substrate (1) and a production method for fabricating the nanowire structure is also provided. The production method utilizes non-epitaxial methods for forming the buffer layer (4).
公开/授权文献
- US20130221322A1 Substrate with Buffer Layer for Oriented Nanowire Growth 公开/授权日:2013-08-29
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